The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment.

Its compact 19″, rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.