Ascent AP Series
Unprecedented Power Control for Single- and Dual-Magnetron Sputtering.
Description
Achieve new levels of process performance using field-proven, bipolar DC pulsing technology.
- Advanced waveform control allows process fine-tuning
- Available for both dual-pulsed and single-pulsed magnetron sputtering applications
- Compact design incorporates DC and pulsing
Overview
Ascent® AP power supplies deliver unprecedented plasma control in a compact solution for single-magnetron and dual-magnetron sputtering. Advanced Energy’s patented pulsing technology enables remarkable arc prevention, higher power levels, and increased throughput. Ascent AP’s comprehensive control parameters and wide operational range unlock material options to extend process flexibility and material innovation.
FEATURES
- Process customization with extensive power delivery parameters
- Advanced process management through a tiered approach to arc mitigation
- Compact, single-unit solution (up to 30 kW)
- Set Point Compensation™ technology for stable throughput
- Wide operational range to enable a variety of process materials
